Key Features

1. Material purity

The impurity content is extremely low (such as the sum of 13 elements including Al and Fe ≤ 2.0 µ g/g), especially controlling the content of Li, Na, and K (≤ 1.0 µ g/g).

The preferred substrate for precision devices such as photomask templates in high-purity synthetic quartz glass.

2. Optical performance

Transmittance ≥ 90% (effective aperture), surface accuracy can reach λ/4 or λ/8.

Suitable for the ultraviolet to infrared wavelength range, particularly outstanding in 193nm lithography technology.

3. Physical parameters

Dimensional tolerance: ± 0.1mm (conventional) or ± 0.05mm (high-precision).

Smooth finish: 60/40-10/5, chamfer<0.25mm × 45 °.

Application field

Lithography technology: The photomask template substrate (accounting for 90% of the raw material cost) needs to meet the high standards of EUV lithography machines.

Display and lighting: LCD backlight, ultra-thin advertising lightbox, medical film viewer.

Laser technology: Optical components of all solid state lasers, such as mirrors and lenses.

Customization options

Support customization of coating, size, angle, etc., material grade needs to be selected according to specific requirements (such as laser power, wavelength).

Precautions

Cleaning and maintenance: Use a soft cleaning cloth and specialized cleaning agent to clean and avoid scratching the surface.

Storage environment: Store in a dry, well ventilated environment to prevent moisture and mold.

Usage: During use, avoid severe vibration and collision to avoid affecting its optical performance.

Please tell us the material, size, laser power, application before quote.